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Scatterometry measurements of line end shortening structures for focus-exposure monitoring [6152-70]

Author(s):
Hung, K. ( United Microelectronics Corp. (Taiwan) )
Cheng, Y. F. ( United Microelectronics Corp. (Taiwan) )
Sun, J. W. ( United Microelectronics Corp. (Taiwan) )
Lin, B. S. M. ( United Microelectronics Corp. (Taiwan) )
Fu, S. ( KLA-Tencor Corp. (USA) )
Dziura, T. G. ( KLA-Tencor Corp. (USA) )
Cusacovich, M. ( KLA-Tencor Corp. (USA) )
Mieher, W. D ( KLA-Tencor Corp. (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61521W
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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