Inline CO metrology with combined use of scatterometry and CO-SEM [6152-69]
- Author(s):
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61521V
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Novel methodology of employing scatterometry to assess optical proximity correction test pattern
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Back end of line metrology control applications using scatterometry [6152-90]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Error factor in bottom CD measurement for conta.ct hole using CD-SEM [6152-185]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Potentials for inspection and metrology of MEMS using a combined scanning electron microscope (SEM) and proximal probe microscope (PPM) (Invited Paper)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |