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The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]

Author(s):
Holsteyns, F. ( IMEC (Belgium) )
Cheung, L. ( KLA-Tencor (USA) )
Van Den Heuvel, D. ( IMEC )
Marcuccilli, G ( KLA-Tencor (USA) )
Simposon, G. ( KLA-Tencor (USA) )
Brun, R. ( KLA-Tencor (USA) )
Steinbach, A.. ( KLA-Tencor (USA) )
Fyen, W. ( IMEC (Belgium) )
Vangoidsenhoven, D. ( IMEC (Belgium) )
Merten, P. ( IMEC (Belgium) )
Maenhoudt, M. ( IMEC (Belgium) )
6 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61521U
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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