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In-line TEM sample preparation and wafer return strategy for rapid yield learning [6152-81]

Author(s):
Bicais-Lepinay, N. ( STMicroelectronics (France) )
Andre, F. ( STMicroelectronics (France) )
Brevers, S. ( STMicroelectronics (France) )
Guyader, P. ( STMicroelectronics (France) )
Trouiller, C. ( STMicroelectronics (France) )
Kwakman, L. F. Tz. ( Philips Semiconductors (France) )
Pokrant, S. ( Philips Semiconductors (France) )
Verkleij, D. ( FEI Co. (Netherlands) )
Schampers, R. ( FEI Co. (Netherlands) )
Ithier, L. ( STMicroelectrpronics (France) )
Sicurani, E. ( CEA-LETI (France) )
6 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. date:
2006
Pt.:
1
Page(from):
615217
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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