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In-field overlay uncertainty contributors: a back end study [6152-39]

Author(s):
Adel, M. ( KLA-Tencor Corp. (Israel) )
Frommer, A. ( KLA-Tencor Corp. (Israel) )
Kassel, E. ( KLA-Tencor Corp. (Israel) )
Izikson, P. ( KLA-Tencor Corp. (Israel) )
Leray, P. ( IMEC(Belgium) )
Schulz, B ( AMD Saxony Limited Liability Company & Co. KG (Germany) )
Seltmann, R. ( AMD Saxony Limited Liability Company & Co. KG (Germany) )
Bush, G. ( AMD Saxony Limited Liability Company & Co. KG (Germany) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
615213
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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