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The limits of image-based optical metrology (Invited Paper) [6152-35]

Author(s):
Silver, R. M. ( National Institute of Standards and Technology (USA) )
Barnes, B. M. ( National Institute of Standards and Technology (USA) )
Attota, R. ( National Institute of Standards and Technology (USA) )
Jun, J. ( National Institute of Standards and Technology (USA) )
Filliben, J. ( National Institute of Standards and Technology (USA) )
Soto, J. ( National Institute of Standards and Technology (USA) )
Stocker, M. ( National Institute of Standards and Technology (USA) )
Lipscomb, P. ( International SEMATECH (USA) )
Marx, E. ( National Institute of Standards and Technology (USA) )
Patrick, H. J.
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520Z
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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