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Impact of line width roughness on device performance [6152-32]

Author(s):
Lorusso, G. F. ( IMEC (Belgium) )
Leunissen, L. H. A. ( IMEC (Belgium) )
Gustin, C. ( IMEC (Belgium) )
Mercha, A. ( IMEC (Belgium) )
Jurczak, M. ( IMEC (Belgium) )
Marchman, H. M. ( Photronics Inc. (USA) )
Azordegan, A. ( KLA-Lencor (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520W
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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