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Tools to measure CD-SEM performance [6152-29]

Author(s):
  • Kim, J. ( Univ. of Tennessee (USA) )
  • Jalhadi, K. ( Univ. of Tennessee (USA) )
  • Deo, S. ( Univ. of Tennessee (USA) )
  • Lee, S. Y. ( Auburn Univ. (USA) )
  • Joy, D. ( Univ. of Tennessee (USA) and Oak Ridge National Lab. (USA) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520T
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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