Accurate in-line CD metrology for nanometer semiconductor manufacturing [6152-26]

Accurate in-line CD metrology for nanometer semiconductor manufacturing [6152-26]

Author(s):

Perng, B. C. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Shieh, J. H. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Jang, S. M. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Liang, M.-S. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Huang, R. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Chen, L. C ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Hwang, R. L. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Hsu, J ( Veeco Instruments Inc. (USA) )

Fong, D. ( Veeco Instruments Inc. (USA) )

4 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

1

Page(from):

61520Q

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings

Details

TDL ID:	ZA00016184
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2006 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.23

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