Blank Cover Image

Improved scatterometry method of critical dimension measurements and its application for control of development process [6152-16]

Author(s):
  • Pundaleva, I. ( Samsung Electronics Co. (South Korea) )
  • Nam, D. ( Samsung Electronics Co. (South Korea) )
  • Han, H. ( Samsung Electronics Co. (South Korea) )
  • Lee, D. ( Samsung Electronics Co. (South Korea) )
  • Han, W. ( Samsung Electronics Co. (South Korea) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]

Chalykh, R., Pundaleva, I., Kim, S., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings High-throughput contact critical dimension and gray level value measurement [6152-143]

Xiao, H., Fang, W., Zhao, Y., Huang, M., Wang, D., Wong, D., Jau, J.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes

I. Pundaleva, R. Chalykh, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Method for prevention of unopened contact hole in dual-damascene process

Lyu,G.-H., Kim,C.-H., Lee,S.-J., Yang,H.-H., Lee,D.-Y., Yoo,J.-Y., Lee,J.-W., Kim,Y.-H., Nam,J.-L., Han,W.-S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings study of critical dimension and overlay measurement methodology using SEM image analysis for process control [6152-91]

Lee, T. Y., Lee, B. H., Chin, S. B., Cho, Y. S, Hong, J. S., Song, C. L

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Novel development method to improve critical dimensional control

Nishiya, A., Sakamoto, K.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Kim, J.-, Kim, S.-J., Chin, S.-B., Oh, S.-H., Goo, D.-H., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T., …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Diffraction signature analysis methods for improving scatterometry precision [6152-125]

Littau, M., Forman, D., Bruce, J., Raymond, C. J., Hummel, S. G.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Kim, H., Nam, D., Yeo, G.-S., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Improved modeling of fogging and loading effect correction [5992-165]

Lee, S., Kim, B., Han, H., Nam, D., Moon, S., Choi, S., Han, W.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]

Yang, D. S., Jung, M. H., Lee, Y. M., Koh, C. W., Yeo, G. S., Woo, S. G., Cho, H. K., Moon, J. T.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Efffectiveness and confirmation of local area flare measurement method in various pattern layouts

Nam, D., Lee, E., Jung, S.-G., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12