Advanced DFM applications using design-based metrology on CD SEM [6152-194]

Advanced DFM applications using design-based metrology on CD SEM [6152-194]

Author(s):

Lorusso, G. F. ( KLA-Tencor (USA) )

Capodieci, L. ( Advanced Micro Devices, Inc (USA) )

Stoler, D. ( KLA-Tencor (USA) )

Schulz, B. ( Advanced Mocro Devices, Inc. (USA) )

Roling, S. ( Advanced Mocro Devices, Inc. (USA) )

Schramm, J. ( Advanced Mocro Devices, Inc. (USA) )

Tabery, C. ( Advanced Mocro Devices, Inc. (USA) )

Shah, K. ( Advanced Mocro Devices, Inc. (USA) )

Singh, B. ( Advanced Mocro Devices, Inc. (USA) )

Abbott, G. ( KLA-Tencor (USA) )

Azordegan, A. ( KLA-Tencor (USA) )

Heinrichs, L. ( KLA-Tencor (USA) )

Kaliblotzky, Z. ( KLA-Tencor (USA) )

Castel, E. ( KLA-Tencor (USA) )

9 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

1

Page(from):

61520B

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings

Details

TDL ID:	ZA00016184
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2006 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.23

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