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Global pattern density effects on low-k trench CDs for sub-65-nm technology nodes [6152-05]

Author(s):
Hsu, J. W. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Shieh, J. H. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Doong, K. Y. Y. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Hung, L. J. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Lin, S. C. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Ting, C. Y. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Jang, S. M. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Young, K. L. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
Liang, M. S. ( Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan) )
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
615205
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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