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Progress on implementation of a CD-AFM・based reference measurement system [6152-24]

Author(s):
  • Orji, N. G. ( National Institute of Standards and Technology (USA) and International SEMATECH Manufacturing Initiative (USA) )
  • Martinez, A. ( ATDF, Inc. (USA) )
  • Dixson, R. ( National Institute of Standards and Technology (USA) )
  • Allgair, J. ( Intemational SEMATECH Manufactuing Initiative (USA) and Freescale Semiconductor, Inc. (USA) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520O
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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