Progress on implementation of a CD-AFM・based reference measurement system [6152-24]
- Author(s):
- Orji, N. G. ( National Institute of Standards and Technology (USA) and International SEMATECH Manufacturing Initiative (USA) )
- Martinez, A. ( ATDF, Inc. (USA) )
- Dixson, R. ( National Institute of Standards and Technology (USA) )
- Allgair, J. ( Intemational SEMATECH Manufactuing Initiative (USA) and Freescale Semiconductor, Inc. (USA) )
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61520O
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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