Debris mitigation for EUV sources using directional gas flows [6151-160]

Debris mitigation for EUV sources using directional gas flows [6151-160]

Author(s):

Soer, W. ( Philips Research (Netherlands) )
Klunder, D. ( Philips Research (Netherlands) )
Van Herpen, M. ( Philips Research (Netherlands) )
Bakker, L. ( Philips Research (Netherlands): )
Banine, V. ( ASML Netherlands (Netherlands) )

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

2

Page(from):

61514B

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

Similar Items:

1 Conference Proceedings Multilayer optics with spectral purity layers for the EUV wavelength range [6151-155] Louis, E., Van de Kruijs, R. W. E, Yakshin, A. E., Van der Westen, S. A, Bijkerk, F., Van Herpen, M. M. J. W., Klunder, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Repeller field debris mitigation approach for EUV sources Takenoshita, K., Koay, C.-S., Richardson, M.C., Turcu, I.C.E. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Complexity reduction for C4 compression for implementation in maskless lithography datapath Klunder, D. J. W., van Herpen, M. M. J. W., Banine, V. Y., Gielissen, K. SPIE - The International Society of Optical Engineering	8 Conference Proceedings A novel nanophotonics biosensor concept for rapid molecular diagnostics D. J. W. Klunder, M. M. J. W. van Herpen, A. Kolesnychenko, E. Hornix, N. Kahya Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings EUV source collector [6151-131] Bowering N R, Ershov A I, Marx W F, Khodykin O V, Hansson B A M, Vargas E, Chavez L J A, Fomenkov I V, Myers D W, Brandt … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Relationship between an EUV source,and the performance of an EUV lithographic system Banine,V., Benschop,J.P.H., Leenders,M., Moors,R. SPIE - The International Society for Optical Engineering
4 Conference Proceedings LPP EUV source developmentfor HVM [6151-26] Hansson, B. A. M., Fomenkov, I. V., Bowering, N. R., Ershov, A.. I., Partio, W. N, Myers, D. W., Khodykin,O.V., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Illinois Debris-Mitigation EUV Applications Laboratory (IDEAL) Jurczyk, B.E., Vargas Lopez, E., Neumann, M.J., Ruzic, D.N. SPIE - The International Society of Optical Engineering
5 Conference Proceedings EUV sources for the alpha-tools [6151-25] Pankert, J., Apetz, R., Bergmann, K., Damen, M., Derra, G., Franken, O., Jassen, M., Jonkers, J., Klein, J., Kraus, H., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources Vargas Lopez, E., Jurczyk, B.E., Jaworski, M.A., Neumann, M.J., Ruzic, D.N. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Debris mitigation techniques for a Sn- and Xe-fueled EUV-light source K. C. Thompson, S. N. Srivastava, E. L. Antonsen, D. N. Ruzic SPIE - The International Society of Optical Engineering	12 Conference Proceedings Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools [6151-24] Stamm, U., Kleinschmidt, J., Bolshukhin, D., Brudermann, J., Hergenhan, G., Korobotchko, V., Nikolaus, B., Schrmann M. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12