Blank Cover Image

EUV generation from lithium laser plasma for lithography [6151-143

Author(s):
George, S. A. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Silfvast, W. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Takenoshita, K. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Bemath,R. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Koay, C. S. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Shimkaveg,G. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Richardson,M. ( College of Optics and Photonics, Univ, of Central Florida (USA) )
Al-Rabban,M. ( Univ.of Qatar (Qatar) )
Scott, H. ( Lawrence Livermore National Lab. (USA) )
4 more
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
2
Page(from):
615143
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Characterization of the tin-doped droplet laser plasma EUVL sources for HVM

K. Takenoshita, S. A. George, T. Schmid, C. Koay, J. Cunado, R. Bernath, C. Brown, M. M. Al-Rabban, W. T. Silfvast, M. …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings High-efficiency tin-based EUV sources

Richardson, M. C., Koay, C. -S., Keyser, C. K., Takenoshita, K., Fujiwara, E., Al-Rabban, M. M.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings EUV mask blank readiness for 45-nm HP 2009 manufacturing

George, S., Koay, C.-S., Takenoshita, K., Bernath, R., Al-Rabban, M., Keyser, C., Bakshi, V., Scott, H., Richardson, M.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings High-conversion-efficiency tin material laser-plasma source for EUVL

Koay, C.-S., Keyser, C.K., Takenoshita, K., Fujiwara, E., Al-Rabban, M.M., Richardson, M.C., Turcu, I.C.E., Rieger, H., …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Diagnostics for laser plasma EUV sources

Richardson, M. C., Koay, C.-S., Takenoshita, K., Keyser, C., Bernath, R., George, S., Teerawattanasook, S.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

Silfvast,W.T., Klosner,M., Shimkaveg,G.M., Bender,H., Kubiak,G.D., Fornaciari,N.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Spectroscopic studies of the Sn-based droplet laser plasma EUV source

Koay, C.-S., Takenoshita, K., Fujiwara, E., Al-Rabban, M.M., Richardson, M.C.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Repeller field debris mitigation approach for EUV sources

Takenoshita, K., Koay, C.-S., Richardson, M.C., Turcu, I.C.E.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Laser plasma EUVL sources: progress and challenges

Richardson, M.C., Koay, C.-S., Takenoshita, K., Keyser, C., George, S., Teerawattansook, S., Al-Rabban, M.M., Scott, H.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings High repetition rate LPP source facility for EUVL

T. Schmid, S. A. George, J. Cunado, S. Teerawattanasook, R. Bernath, C. Brown, K. Takenoshita, C. Koay, M. Richardson

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Debris studies for the tin-based droplet laser-plasma EUV source

Takenoshita, K., Koay, C.-, Teerawattanasook, S., Richardson, M.C.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Characterization of a laser plasma water droplet EUV source

F. Jin, M.C. Richardson, G.M. Shimkaveg, D. Torres

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12