Achieving mask-based imaging with optical maskless lithography [6151-87]
- Author(s):
Stone, E. M. ( ASML (USA) ) Hintersteiner, J. D. ( ASML (USA) ) Cebuhar, W. A. ( ASML (USA) ) Albright, R. ( ASML (USA) ) Eib, N. K. ( LSI Logic Corp. (USA) ) Latypov, A. ( ASML (USA) ) Baba-Ali, N. ( ASML (USA) ) Poultney, S. K. ( ASML (USA) ) Croffie, E. H. ( LSI Logic Corp. (USA) ) - Publication title:
- Emerging Lithographic Technologies X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6151
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61512E
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- Language:
- English
- Call no.:
- P63600/6151
- Type:
- Conference Proceedings
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