Combined absorber stack for optimization of the EUVL mask [6151-71]
- Author(s):
Lee, S. Y. ( Hanyang Univ. (South Korea) ) Kim, T. G. ( Hanyang Univ. (South Korea) ) Kim, C. Y. ( Hanyang Univ. (South Korea) ) Kong, I.-Y. ( Hanyang Univ. (South Korea) ) Chung, Y. C. ( Hanyang Univ. (South Korea) ) Ahn, J. ( Hanyang Univ. (South Korea) ) - Publication title:
- Emerging Lithographic Technologies X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6151
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61511Y
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- Language:
- English
- Call no.:
- P63600/6151
- Type:
- Conference Proceedings
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