EUV lithography simulation for the 32 nm node [6151-31]
- Author(s):
Kim, E. J. ( Hanyang Univ. (South Korea) ) Chang, W. ( Hanyang Univ. (South Korea) ) Park, J. B. ( Hanyang Univ. (South Korea) ) Kim, S. J. ( Hanyang Univ. (South Korea) ) Kim, J. S. ( Hanyang Univ. (South Korea) ) Oh, H. K. ( Hanyang Univ. (South Korea) ) - Publication title:
- Emerging Lithographic Technologies X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6151
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61510V
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- Language:
- English
- Call no.:
- P63600/6151
- Type:
- Conference Proceedings
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