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EUV lithography simulation for the 32 nm node [6151-31]

Author(s):
Kim, E. J. ( Hanyang Univ. (South Korea) )
Chang, W. ( Hanyang Univ. (South Korea) )
Park, J. B. ( Hanyang Univ. (South Korea) )
Kim, S. J. ( Hanyang Univ. (South Korea) )
Kim, J. S. ( Hanyang Univ. (South Korea) )
Oh, H. K. ( Hanyang Univ. (South Korea) )
1 more
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
1
Page(from):
61510V
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

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