Development of C02 laser produced Xe plasma EUV light source for microlithography [6151-27]

Development of C02 laser produced Xe plasma EUV light source for microlithography [6151-27]

Author(s):

Mizoguchi, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Endo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Arigo, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Miura, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hoshino, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ueno, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Nakano, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Komori, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Sumitani, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Abe, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Suganuma, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Soumagne, G. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Someya, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Takabayashi, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Toyoda, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

10 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

1

Page(from):

61510S

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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