A year in the life of an immersion lithography alpha tool at Albany Nanotech (Keynote Address) [6151-01]

A year in the life of an immersion lithography alpha tool at Albany Nanotech (Keynote Address) [6151-01]

Author(s):

Tittnich, M ( SUNY/Univ. at Albany (USA) )

Hartley, J ( SUNY/Univ. at Albany (USA) )

Denbeaux, G ( SUNY/Univ. at Albany (USA) )

Okoroanyanwu, U. ( Advanced Micro Devices (USA) )

Levinson, H ( Advanced Micro Devices (USA) )

Petrillo, K. ( IBM (USA) )

Robinson, C. ( IBM (USA) )

Gil, D. ( IBM (USA) )

Corliss, D. ( IBM (USA) )

Back, D ( Infineon Technologies (USA) )

Brandl, S ( Infineon Technologies (USA) )

Schwarz, C ( Infineon Technologies (USA) )

Goodwin, F. ( Infineon Technologies (USA) )

Wei, Y. ( Infineon Technologies (USA) )

Martinick, B. ( Infineon Technologies (USA) )

Housley, R. ( Micron Technology (USA) )

Benson, P. ( Micron Technology (USA) )

Cummings, K ( ASML (USA) )

13 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

1

Page(from):

615101

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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