Method for measuring the granite surface topography of wafer stage with laser interferometer [6150-42]

Method for measuring the granite surface topography of wafer stage with laser interferometer [6150-42]

Author(s):

He, L. ( Shanghai Institute of Optics and Fine Mechanics, CAS (China) and Chinese Academy of Sciences (China) )
Wang, X. ( Shanghai Institute of Optics and Fine Mechanics, CAS (China) and Chinese Academy of Sciences (China) )
Shi, W. ( Shanghai Institute of Optics and Fine Mechanics, CAS (China) and Chinese Academy of Sciences (China) )
Hu, J. ( Shanghai Institute of Optics and Fine Mechanics, CAS (China) and Chinese Academy of Sciences (China) )

Publication title:

2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6150

Pub. Year:

2006

Pt.:

1

Page(from):

615008

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461896 [081946189X]

Language:

English

Call no.:

P63600/6150

Type:

Conference Proceedings

Details

TDL ID:	ZA00016182
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Advanced Optical Manufacturing and Testing Technologies
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Xian, China
Conf. info. (Date):	2005.11.02-2005.11.05

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