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In-line implant and RTP process monitoring using the carrier illumination technique for 65 nm and beyond [6104-35]

Author(s):
Li, C. I. ( United Microelectronics Corp. (Taiwan) )
Chuang, H. L. ( United Microelectronics Corp. (Taiwan) )
Chen, P. Y. ( United Microelectronics Corp. (Taiwan) )
Liu, C. H. ( United Microelectronics Corp. (Taiwan) )
Chien, C. C. ( United Microelectronics Corp. (Taiwan) )
Huang, K. T. ( United Microelectronics Corp. (Taiwan) )
Tzou, S. F. ( United Microelectronics Corp. (Taiwan) )
2 more
Publication title:
High-Power Diode Laser Technology and Applications IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6104
Pub. Year:
2006
Page(from):
61040T
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461469 [0819461466]
Language:
English
Call no.:
P63600/6104
Type:
Conference Proceedings

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