Silicon dry etching profile control by RIE at room temperature for MEMS applications [6037-88]

Silicon dry etching profile control by RIE at room temperature for MEMS applications [6037-88]

Author(s):

Vrtacnik D.
Resnik D.
Aljancic U.
Mozek M.
Amon S. ( Univ. of Ljubljana (Slovenia) )

Publication title:

Device and process technologies for microelectronics, MEMS, and photonics IV : 12-14 December 2005, Brisbane, Australia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6037

Pub. Year:

2006

Page(from):

603720

Page(to):

603722

Pages:

3

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460684 [0819460680]

Language:

English

Call no.:

P63600/6037

Type:

Conference Proceedings

Details

TDL ID:	ZA00016072
Series ID:	PA00000029
Conf. info. (Name):	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for microelectronics, MEMS, and photonics
Conf. info. (Number):	2005 : 4th
Conf. info. (Venue):	Brisbane, Australia
Conf. info. (Date):	2005.12.12-2005.12.14

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