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3D photoresist etching simulation using cellular automata [6034-26]

Author(s):
Publication title:
ICO20: optical design and fabrication : 21-26 August 2005, Changchun, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6034
Pub. Year:
2006
Page(from):
60340Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460653 [0819460656]
Language:
English
Call no.:
P63600/6034
Type:
Conference Proceedings

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