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An ICP etch model based on time multiplexed deep etching [6032-16]

Author(s):
Publication title:
ICO20 : MEMS, MOEMS, and NEMS : 21-26 August, 2005, Changchun, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6032
Pub. Year:
2006
Page(from):
60320G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460639 [081946063X]
Language:
English
Call no.:
P63600/6032
Type:
Conference Proceedings

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