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Substrate bias effect on preparation of nanocrystalline silicon carbide thin films in helicon wave plasma chemical vapor depostion [6029-34]

Author(s):
Publication title:
ICO20 : materials and nanostructures : 21-26 August, 2005, Changchun, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6029
Pub. date:
2006
Page(from):
60290Y
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460608 [0819460605]
Language:
English
Call no.:
P63600/6029
Type:
Conference Proceedings

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