Photonic crystal fabrication on silicon-on-insulator (SOI) using 248nm and 193nm lithography (Invited Paper) [6017-13]

Photonic crystal fabrication on silicon-on-insulator (SOI) using 248nm and 193nm lithography (Invited Paper) [6017-13]

Author(s):

Salib M. ( Intel Corp. (USA) )

Michaeli A.

Lazar A.

Bechor H. ( Intel Corp. (Israel) )

Settle M.

Krauss Univ. of St. Andrews (United Kingdom)

1 more

Publication title:

Nanophotonics for communication : materials and devices II : 24 and 26 October, 2005, Boston, Massachusetts, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6017

Pub. Year:

2005

Page(from):

60170B

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460417 [0819460419]

Language:

English

Call no.:

P63600/6017

Type:

Conference Proceedings

Details

TDL ID:	ZA00016052
Series ID:	PA00000029
Conf. info. (Name):	Optics East : Nanophotonics for communication
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2005.10.24, 2005.10.26

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