FPGA chip performance improvement with gate shrink through alternating PSM 9Onm process [5992-182]
- Author(s):
Yu, C. -C. Shieh, M. -F. Liu, E. Lin, B. ( UMC (Taiwan) ) Ho, J. Wu, X. ( Xilinx Inc. (USA) ) Panaite, P. Chacko, M. Zhang, Y. Lei, W. ( Synopsys Inc. (USA) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 59925A
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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