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Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring [5992-141]

Author(s):
Su, B.
Verma, G.
Wolk, W.
Ahmadian, M.
Du, H.
Vikram, A.
Andrews, S. ( KLA-Tencor Corp. (USA) )
Cheng, Y. F.
Chou, Y. L.
Yang, C. H.
Lin, C. ( United Microelectronics Corp. (Taiwan) )
6 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
599244
Page(to):
599244
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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