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Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110]

Author(s):
Chen, T.
Van Den Broeke, D.
Hsu, S.
Park, S.
Berger, G.
Coskun, T.
de Vocht, J.
Chen, F. ( ASML MaskTools, Inc. (USA) )
Socha, R. ( ASML TDC (USA) )
Park, J.
Gronlund, K. ( ASML MaskTools, Inc. (USA) )
6 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. date:
2005
Pt.:
2
Page(from):
599239
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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