Manufacturabilily study of masks created by inverse lithography technology (ILT) [5992-106]
- Author(s):
Martin, P. M. Progler, C. J. Xiao, G. Gray, R. ( Photronics Inc. (USA) ) Pang, L. Liu, Y. ( Luminescent Technologies Inc. (USA) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 599235
- Page(to):
- 599236
- Pages:
- 2
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Laser and e-beam mask-to-silicon with inverse lithography technology (ILT) [5992-74]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Inverse lithography technology principles in practice: unintuilive patterns [5992-102]
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation [6154-58]
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Validation of inverse lithography technology (ILT) and its adaptive SRAF at advanced technology nodes
Society of Photo-optical Instrumentation Engineers |