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Model-based insertion and optimization of assist features with application to contact layers [5992-71]

Author(s):
Shang, S. D.
Granik, Y.
Swallow, L. ( Mentor Graphics Corp. (USA) )
Zhang, L. ( Mentor Graphics Corp. (China) )
Brist, T.
Torres, A. ( Mentor Graphics Corp. (USA) )
Hung, C.
Liu, Q. ( Semiconductor Manufacturing International Corp. (China) )
3 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
1
Page(from):
59921Y
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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