Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62]
- Author(s):
Ma, J. Han, K. Lee, K. Korobko, Y. Silva, M. Chavez, J. Irvine, B. Henrichs, S. Chakravorty, K. Olshausen, R. Chandramouli, M. Mammen, B. Padmanaban, R. ( Intel Corp (USA) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 59921P
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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