Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
- Author(s):
Bekaert, J. Philipsen, V. Vandenberghe, G. ( IMEC (Belgium) ) van den Broeke, D. ( ASML MAskTools Inc. (USA) ) Degel, W. Zibold, A. ( Carl Zeiss SMS GmbH (Germany) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 59921O
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Experimental evaluation of bull’s-eye illumination for csslst-free random contact printing at sub-65nm node [6154-39]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]
SPIE - The International Society of Optical Engineering |