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Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]

Author(s):
Bekaert, J.
Philipsen, V.
Vandenberghe, G. ( IMEC (Belgium) )
van den Broeke, D. ( ASML MAskTools Inc. (USA) )
Degel, W.
Zibold, A. ( Carl Zeiss SMS GmbH (Germany) )
1 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
1
Page(from):
59921O
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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