Blank Cover Image

Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]

Author(s):
Bekaert, J.
Philipsen, V.
Vandenberghe, G. ( IMEC (Belgium) )
van den Broeke, D. ( ASML MAskTools Inc. (USA) )
Degel, W.
Zibold, A. ( Carl Zeiss SMS GmbH (Germany) )
1 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
1
Page(from):
59921O
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]

Van Look, L., Kasprowicz, B., Zibold, A., Degel, W., Vandenberghe, G.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]

Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Mask topography effect in chromeless phase lithography

Philipsen, V., Bekaert, J., Vandenberghe, G., Jonckheere, R., Van Den Broeke, D., Socha, R.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Experimental evaluation of bull’s-eye illumination for csslst-free random contact printing at sub-65nm node [6154-39]

Finders, J., Engelen, A., Vandenberghe, G., Bekaert, J., Chen, T.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Through-pitch low-k1 contact hole imaging with CPL technology

Wiaux, V., Bekaert, J., Chen, J.F., Hsu, S.D., Ronse, K.G., Socha, R.J., Vandenberghe, G., Van Den Broeke, D.J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Applications of CPL mask technology for sub-65nm gate imaging

Litt, L. C., Conley, W., Wu, W., Peters, R., Parker, C., Cobb, J., Kasprowicz, B. S., van den Broeke, D., Park, J. C., …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography

J. Bekaert, E. Hendrickx, G. Vandenberghe

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node

Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Double exposure technique for 45nm node and beyond [5992-63]

Hsu, S., Park, J., Van Den Broeke, D., Chen, J. F.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05]

Cho, W. I., Park, J. H., Chung, D. H., Choi, S. W., Han, W. S.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]

Hsu, M., Chen, F. J., Van Den Broeke, D., En Tszng, S., Shieh, J., Hsu, S., Shi, X.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12