Through-process window resist modelling strategies for the 65 nm node [5992-46]

Through-process window resist modelling strategies for the 65 nm node [5992-46]

Author(s):

Borjon, A. ( Philips Semiconductors (France), Freescale Semiconductor (France), LETI-CEA (France), STMicroelectronics (France), and LTM-CNRS (France) )

Belledent, J. ( Philips Semiconductors (France) )

Troullier, Y. ( LETI-CEA (France) )

Patterson, K.

Lucas, K. ( Freescale Semiconducto (France) )

Couderc, C. ( Philips Semiconductors (France) )

Sundermann, F.

Urbani, J. -C.

Baron, S. ( STMicoelectronics (France) )

Rody, Y. ( Philips Semiconductors (France) )

Gardin, C. ( Freescale Semiconducto (France) )

Foussadier, F. ( STMicoelectronics (France) )

Schiavone, P. ( LTM-CNRS (France) )

8 more

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

1

Page(from):

599219

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

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