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The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging [5992-37]

Author(s):
Geh, B. ( Carl Zeiss / ASML-TDC (USA) )
Flagello, D. G. ( ASML US Inc. (USA) )
Pregler, C.
Martin, P. M. ( Photronics Inc. (USA) )
Leunissen, L. H. A. ( IMEC (Belgium) )
Hansen, S. ( ASML US, Inc. (USA) )
de Boeij, W. ( ASML Netherlands B.V. (Netherlands) )
2 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
1
Page(from):
599210
Page(to):
599210
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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