A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging [5992-35]
- Author(s):
- Iwase, K.
- Ishikawa, K.
- Takeuchi, K.
- Ozawa, K.
- Uesawa, F. ( Sony Corp. (Japan) )
- Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 59920Y
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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