DfM requirements and ROI analysis for system-on-chip [5992-15]

DfM requirements and ROI analysis for system-on-chip [5992-15]

Author(s):: Balasinski, A. ( Cypress Semiconductor Corp. (USA) )
Publication title:: 25th Annual BACUS Symposium on Photomask Technology
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5992
Pub. Year:: 2005
Pt.:: 1
Page(from):: 59920F
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819460141 [0819460141]
Language:: English
Call no.:: P63600/5992
Type:: Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

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