Mask design rules (45 nm): time for standardization [5992-13]
- Author(s):
Mason, M. ( Texas Instruments Inc. (USA) ) Progler, C. J. Martin, P. ( Photronics Inc. (USA) ) Ham, Y. -M. Dillon, B. Pack, R. Heins, M. Gookassian, J. Garcia, J. Boksha, V. ( HPL Technologies Inc. (USA) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 59920D
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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