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Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication [5992-09]

Author(s):
Kim, D. Y.
Cho, W. I.
Park, J. H.
Chung, D. H.
Cha, B. C.
Choi, S. W.
Han, W. S. ( Samsung Electronics Co., Ltd (South Korea) )
Park, K. H.
Kim, N. W.
Hess, C.
Ma, W.
Kim, D. ( KLA-Tencor Corp (USA) )
7 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. date:
2005
Pt.:
1
Page(from):
599209
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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