VUV spectrophotometry for photomasks characterization at 193 nm [5965-59]

VUV spectrophotometry for photomasks characterization at 193 nm [5965-59]

Author(s):

Yang, M.

Leiterer, J.

Gatto, A.

Kaiser, N. ( Fraunhofer-Institut fur Optik und Feinmechanik (Germany) )

Hollein, I.

Teuber, S.

Bubke, K. ( Advanced Mask Technology Ctr. GmbH and Co. KG (Germany) )

2 more

Publication title:

Optical fabrication, testing and metrology II : 13-15 September 2005, Jena, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5965

Pub. Year:

2005

Page(from):

59651L

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819459831 [0819459836]

Language:

English

Call no.:

P63600/5965

Type:

Conference Proceedings

Details

TDL ID:	ZA00016002
Series ID:	PA00000029
Conf. info. (Name):	SPIE Optical Systems Design : Optical fabrication, testing and metrology
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Jena, Germany
Conf. info. (Date):	2005.09.13-2005.09.15

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