Catadioptric projection lenses for immersion lithography [5962-32]

Catadioptric projection lenses for immersion lithography [5962-32]

Author(s):

Feldmann, H.

Dodoc, A.

Epple, A.

Rostalski, H. -J. ( Carl Zeiss AG (Germany) )

Shafer, D. ( David Shafer Optical Design (USA) )

Ulrich, W. ( Carl Zeiss SMT AG (Germany) )

1 more

Publication title:

Optical Design and Engineering II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5962

Pub. Year:

2005

Pt.:

1

Page(from):

59620Y

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819459800 [0819459801]

Language:

English

Call no.:

P63600/5962

Type:

Conference Proceedings

Details

TDL ID:	ZA00015999
Series ID:	PA00000029
Conf. info. (Name):	SPIE Optical Systems Design : Optical Design and Engineering
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Jena, Germany
Conf. info. (Date):	2005.09.13-2005.09.16

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