Structural study of ZrO2 and HfO2 thin films grown by atomic layer deposition [5946-14]

Structural study of ZrO2 and HfO2 thin films grown by atomic layer deposition [5946-14]

Author(s):

Niilisk, A.

Aarik, J.

Uustare, T.

Mamdar, H ( Univ. of Tartu (Estonia) )

Tkachev, S.

Manghnani, M. ( Univ. of Hawaii, (USA) )

1 more

Publication title:

Optical materials and applications : 6-9 July 2004, Tartu, Estonia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5946

Pub. Year:

2005

Page(from):

59460E

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819459534 [0819459534]

Language:

English

Call no.:

P63600/5946

Type:

Conference Proceedings

Details

TDL ID:	ZA00015983
Series ID:	PA00000029
Conf. info. (Name):	Optical materials and applications
Conf. info. (Number):	2004
Conf. info. (Venue):	Tartu, Estonia
Conf. info. (Date):	2004.07.06-2004.07.09

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