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pVD High-k Gate Dielectrics with FUSI Gate and Influence of PDA Treatment on On-State Drive Current

Author(s):
Niwa, M.
Mitsuhashi, R.
Yamamoto, K.
Hayashi, S.
Rothchild, A.
Kubicek, S.
De Gendt, S.
Biesemans, S.
3 more
Publication title:
Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices
Title of ser.:
NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.:
220
Pub. date:
2006
Page(from):
1
Page(to):
17
Pages:
17
Pub. info.:
Dordrecht: Springer
ISBN:
9781402043659 [1402043651]
Language:
English
Call no.:
N17050/220
Type:
Conference Proceedings

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