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THE MICROSTRUCTURE OF SILICON-ON-INSULATOR STRUCTURES FORMED BY HIGH DOSE OXYGEN ION IMPLANTATION

Author(s):
Publication title:
Metastable materials formation by ion implantation : proceedings of the Materials Research Society annual meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
7
Pub. date:
1982
Page(from):
401
Page(to):
408
Pages:
8
Pub. info.:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444006929 [0444006923]
Language:
English
Call no.:
M23500/7
Type:
Conference Proceedings

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