INFLUENCE OF OXYGEN ON THE IRIDIUM SILICIDE FORMATION BY RAPID THERMAL ANNEALING
- Author(s):
- Publication title:
- Infrared detectors : materials, processing, and devices : symposium held April 14-16, 1993, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 299
- Pub. Year:
- 1994
- Page(from):
- 325
- Page(to):
- 328
- Pages:
- 4
- Pub. info.:
- Pittsburgh, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991958 [1558991956]
- Language:
- English
- Call no.:
- M23500/299
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
North-Holland |
MRS - Materials Research Society |
Materials Research Society |
4
Conference Proceedings
FORMATION OF SILICIDES BY RAPID THERMAL ANNEALING OVER POLYCRYSTALLINE SILICON
Materials Research Society |
10
Conference Proceedings
COMPARISON OF SILICIDE FORMATION BY RAPID THERMAL ANNEALING AND CONVENTIONAL FURNACE ANNEALING
Materials Research Society |
5
Conference Proceedings
Influence of Rapid Thermal Annealing on Thermal Donor Formation and Oxygen Precipitation in Czochralski Silicon
Electrochemical Society |
Materials Research Society |
Materials Research Society |
12
Conference Proceedings
Formation of SiGe Nanoparticles by Dry and Steam Thermal Oxidation of Thin Polycrystalline Layers
Materials Research Society |