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LOW FILAMENT TEMPERATURE DEPOSITION OF a-Si:H BY CATALYTIC CHEMICAL VAPOR DEPOSITION

Author(s):
Brogueira, P.
Grebner, S.
Wang, F.
Schwarz, R.
Chu, V.
Conde, J.P.
1 more
Publication title:
Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
297
Pub. Year:
1993
Page(from):
121
Page(to):
126
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991934 [155899193X]
Language:
English
Call no.:
M23500/297
Type:
Conference Proceedings

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