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EFFECTS OF ELECTRODE SPACING AND HYDROGEN DILUTION ON a-SiC:H AND a-Si:H LAYERS

Author(s):
Daey Ouwens, J.
Schropp, R.E.I.
van der Werf, C.H.M.
von der Linden, M.B.
Maree, C.H.M.
van der Weg, W.F.
Rava, P.
Demichelis, F.
Pirri, C.F.
Tresso, E.
5 more
Publication title:
Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
297
Pub. Year:
1993
Page(from):
61
Page(to):
66
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991934 [155899193X]
Language:
English
Call no.:
M23500/297
Type:
Conference Proceedings

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