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COMPARISON OF THE DENSITY AND DISTRIBUTION OF TRAPS GENERATED BY HIGH VOLTAGE STRESS IN SILICON OXIDE AND SILICON OXYNITRIDES

Author(s):
Richardson, J.T.
Dumin, D.J.
Lo, G.Q.
Kwong, D.L.
Gross, B.J.
Sodini, C.G.
1 more
Publication title:
Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
284
Pub. Year:
1993
Page(from):
357
Page(to):
362
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991798 [1558991794]
Language:
English
Call no.:
M23500/284
Type:
Conference Proceedings

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